Sputterende Doelstellingen
(78)
Koperplaat het Sputteren Doel ultra Hoge Zuiverheid 99,999%, 99.9999%
Prijs: 15～100USD/kg
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Copper Plate Sputtering Target, Sputtering Target Ultra High Purity
Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For precise control of impurity content, Ag cont... Bekijk meer
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Titaniumplaat het Sputteren Doelstellingen Hoge Zuiverheid voor Halfgeleiderspaanders
Prijs: 20～200USD/kg
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Titanium Plate Sputtering Targets, Sputtering Target For Semiconductor Chips, Customized CIP Sputtering Target
Titanium Plate Sputtering Target high purity 99.99%, 99.999% High purity material, ultra-high purity material, semiconductor high purity material Products include low oxygen ultra-high purity titanium material, high-end titanium alloy material, production equipment and process development of low oxy... Bekijk meer
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Het Metaal Sputterende Doelstellingen van de zirconiumzr702 Hoge Zuiverheid
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:High Purity Metal Sputtering Targets, Zirconium Sputtering Targets, Zr702 Sputtering Targets
High Purity Metal Sputtering Targets Zirconium is an active metal with a great affinity for oxygen, and the excellent corrosion resistance of the oxide film determines that it can be competent in multiple corrosive environments. 3. Zirconium has good corrosion resistance in nitric acid not more than... Bekijk meer
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99.95% het zuivere Sputterende Doel van Zr van het Zirconium Sputterende Doel voor Opticaindustrie
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:PVD Coating Sputtering Targets, Forged Sputtering Targets, Zirconium Zr702 Sputtering Targets
99.95% Pure Zirconium Sputtering Target Zr Sputtering Target for Optics Industry we focus on zirconium materials and its application for a long time. zirconium sputtering target and arc cathodes are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, ho... Bekijk meer
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Het chromium sputtert Coater Doelstellingen, de Sputterende Doelstellingen van Chromiumcr, sputtert de Schijf of Ringvormig Doelstellingen voor sputtert Coaters
Prijs: 20～100USD/kg
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Chromium Sputter Coater Targets,Chromium Cr Sputtering Targets,Disc or Annular Sputter Targets for Sputter Coaters Information Chromium is one of the most popular metals in the world. Chromium is a silvery, lustrous, hard, and brittle metal known for its high mirror polish and corrosion resistance. ... Bekijk meer
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Filmen de titanium Cilindrische Sputterende Doelstellingen, het Doel van de Titanium Roterende Cilinder dun Deposito, Magnetron
Prijs: 20～200USD/kg
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Titanium Cylindrical Sputtering Targets,Titanium Rotating Cylinder Target Thin Film Deposition, Magnetron high purity Rotatory Titanium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physica... Bekijk meer
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99.8% Ti70Al30-het Sputteren Doelstellingen Vacuüm het Smelten Technieken
Prijs: 10-100USD/kg
MOQ: 10kgs
Tijd om te bezorgen: 10days
Merk: Jinxing
Hoog licht:Ti70Al30 Sputtering Targets, 99.8% tial Sputtering Targets, Vacuum Melting Sputtering Targets
Ti70Al30 Sputtering Targets JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver, red and rainbow color simulation on items such as cell phone, watch, glasses, bath parts and hardware, artwork, etc. Ti, Cr, Zr, TiAl, Ni, Cu,... Bekijk meer
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De Legering van het het Titaniumaluminium van Ti50Al50tial met Hoge Zuiverheid 99%
Prijs: USD50-100
MOQ: 10kgs
Tijd om te bezorgen: 15days
Merk: JX
Hoog licht:Ti50Al50 Titanium Aluminum Alloy, 99% Titanium Aluminum Alloy, Ti50Al50 TiAl Alloy
Titanium Aluminum (TiAl) Alloy with high purity 99% Ti50Al50 Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target by HIP will be higher density. The target by melting will be higher purity. All is based on your application, JX will offer the right one for yo... Bekijk meer
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Het Aluminium Sputterende Doelstellingen TiAl7030 van het hoge Zuiverheidstitanium
Prijs: USD50-100
MOQ: 10kgs
Tijd om te bezorgen: 15days
Merk: JX
Hoog licht:Titanium Aluminum Sputtering Targets, High Purity Sputtering Targets, TiAl7030 Sputtering Targets
high purity Titanium Aluminum Sputtering Target TiAl7030 To better serve you, we would like to discuss your specific requirement, Please Contact Us for a quote. Titanium Aluminum Sputtering Target Features Titanium aluminum alloy sputtering target can be made by two ways, HIP and melting. The target... Bekijk meer
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Het Sputteren van Alsi van het aluminiumsilicium Doelstellingen 90:10/80:20 At% Verdampingsmateriaal
Prijs: 20～150USD/kg
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Aluminum Silicon Alsi Sputtering Targets, Alsi Sputtering Targets 90:10, 80:20 Alsi Sputtering Targets
Aluminum Silicon Sputtering Target (AlSi) alloy 90:10/ 80:20 at% After the development of sputtering coating technology in recent years, the coating technology for various materials has been very perfect. Jinxing company provides a full range of sputtering coating targets (including metal targets, a... Bekijk meer
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Opgepoetste het Molybdeen Sputterende Doelstellingen van ASTM B386 PVD
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Polished Molybdenum Sputtering Targets, PVD Sputtering Targets, ASTM B386 Sputtering Targets
Polished surface Molybdenum Round Sputtering Target Metal For PVD Molybdenum is a silver-white metal, hard and tough, high melting point, high thermal conductivity,molybdenum has the advantages of high strength, high melting point, corrosion resistance, wear resistance, etc., Molybdenum Sputtering T... Bekijk meer
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De Legering van het titaniumaluminium het Sputteren Doelstellingen HEUP het Drukken
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Aluminum Alloy Sputtering Targets, Titanium Sputtering Targets, HIP Pressing Sputtering Targets
Titanium Sputtering target Size 1. Round target: Ø30--2000mm, thickness 3.0mm--300mm;2. Plate Targe: Length: 200-500mm Width:100-230mm Thickness:3--40mm3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm4. Customized is available Grade Titanium (Gr1, Gr2, Gr5, Gr7,GR12) Alloy target: Ti-... Bekijk meer
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Van het de Vacuümdeklaagzr702 Zirconium van PVD het Sputterende Doel
Prijs: Negotiable
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Vacuum Coating Zirconium Sputtering Target, PVD Coating Zirconium Sputtering Target, Zr702 Zirconium Sputtering Target
High Quality Zirconium Target for PVD Vacuum Coating Machine Zirconium Sputtering Target For Coating Zirconium target: 1. Zirconium target, Zr702 2. Zr705 3.Ti/Zr alloy 4. Nb/Zr alloyOther grade and alloy 5. by request 6.Type: plane target, step target, rotating target 7.Standard: national standard... Bekijk meer
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Ti70% Al30% Tial Doel in niet corrosieve kleppen
Prijs: 10-100USD/kg
MOQ: 10kgs
Tijd om te bezorgen: 10days
Merk: Jinxing
Hoog licht:Al30% Tial Target, Ti70% Tial Target, Ti70al30 Tial Target
Ti70al30 TiAl Targets Titanium-aluminum alloy sputtering targets (TiAl Targets )can be manufactured in two ways: HIP and melting. The goal through HIP will be higher density. The target through melting will have a higher purity. Everything is based on your application. Purity: Al-Ti35/65 at% Al/Ti 5... Bekijk meer
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Al 35% Aluminium van het het Doeltitanium van Ti 65% het Sputterende
Prijs: 10-100USD/kg
MOQ: 10kgs
Tijd om te bezorgen: 10days
Merk: Jinxing
Hoog licht:Ti 65% Sputtering Target, Al 35% Sputtering Target, Al 35% tantalum sputtering target
Sputtering Target Titanium-Aluminum Aluminum titanium (AlTi) alloy sputtering targets are produced by HIP technology and are widely used in tool coatings and decorative coatings. Compared with the melting process, the TiAl target prepared by the HIP process has a more uniform microscopic internal st... Bekijk meer
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Gesmeed het Doel Hoog Warmtegeleidingsvermogen van TiAl van het Titaniumaluminium
Prijs: 10-100USD/kg
MOQ: 10kgs
Tijd om te bezorgen: 10days
Merk: jx
Hoog licht:Titanium Aluminum TiAl Target, Forged TiAl Target, HIP TiAl Target
Titanium Aluminum (TiAl) Targets Titanium aluminum (TiAl) targets and cathodes allow drills, milling machines, indexable cutting inserts and other tools to be protected by a strong anti-oxidation nitride coating (TiAlN). High feed rate, excellent cutting performance, high metal removal rate: this is... Bekijk meer
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Dia 300mm van het de Legeringsdoel van het Aluminiumtitanium Opbrengst van het de Matrijzenafgietsel de Hoge
Prijs: 10-100USD/kg
MOQ: 10kgs
Tijd om te bezorgen: 10days
Merk: jx
Hoog licht:300mm Aluminum Titanium Alloy Target, Die Castin Aluminum Titanium Alloy Target, Aluminum Titanium Alloy Target
Aluminum Titanium Alloy Target Aluminum Titanium Alloy Target is a metal material with high die-casting yield, high density, high strength and good flexibility. The difference between aluminum-titanium alloy and titanium-aluminum alloy lies in the ratio of these two elements. Aluminum-titanium alloy... Bekijk meer
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De Sputterende Doelstellingen Ti70Al30 Ti75Al25 van Ti-Al van het titaniumaluminium
Prijs: USD50-100
MOQ: 10kgs
Tijd om te bezorgen: 15days
Merk: JX
Hoog licht:Ti-Al Sputtering Targets, Ti70Al30 Sputtering Targets, Ti75Al25 Sputtering Targets
Titanium Aluminum target, Ti-Al target Ti70Al30, Ti75Al25 Ti-Al target Widely used in Decorating films. Gold, silver, balck and coloful series Decorating films And used in some functional films. Wear resistance film, anti-friction film, corrosin resistance film, self-lubricating film. competitive an... Bekijk meer
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Het fijne het Wolfram Sputterende Doel van de Korrelgrootte met Heup/Cip/smeedt Proces
Prijs: 20～150USD/kg
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Fine Grain Tungsten Sputtering Target, Sputtering Target With Hip, Forge Process Tungsten Sputtering Target
Tungsten Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared b... Bekijk meer
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Zirconiumzr702 Sputterend Doelstellingen Diameter140mm/D60mm /57mm ISO 9001 Certificaat
Prijs: 20～100USD/kg
MOQ: 1kg
Tijd om te bezorgen: 10～25 work days
Merk: JINXING
Hoog licht:Diameter 140 mm Sputtering Targets, Decorative coating Sputtering Targets, 57 mm Sputtering Targets
Zirconium Target Magnetron sputtering target Diameter 140mm/D60mm /57mm Zirconium target for PVD coating systerm, coating target, multi-arc target, sputtering target, vacuum coating target. JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spra... Bekijk meer
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